Deposition (CVD and PVD)

Which correctly describes the basic way an LSI is built in manufacturing?

  1. AParts are glued together
  2. BSteps such as deposition, lithography and etching are repeated dozens of times to build up layers
  3. CThe wafer is processed just once to finish it
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Answer: B. Steps such as deposition, lithography and etching are repeated dozens of times to build up layers

An LSI is made by repeating steps such as depositing films (deposition), transferring patterns (lithography), removing unwanted material (etching), introducing impurities and cleaning, dozens or hundreds of times, building up transistors and many layers of wiring.

  • A. The interior of an LSI is not glued together but built by repeated steps.
  • B. Correct. Steps are repeated to build up layers.
  • C. It cannot be made in a single processing step.
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More Deposition (CVD and PVD) questions

  1. What is the main reason many deposition processes are carried out in vacuum equipment?
  2. Which deposition method has mainly been used to form aluminum wiring films?
  3. What does "sputter yield" mean in sputtering?
  4. Which correctly describes silicon nitride deposited by plasma CVD?
  5. When filling a narrow trench by deposition, what problem tends to occur if film builds up thickly near the trench opening (overhang)?