Deposition (CVD and PVD)

What is an advantage of vacuum evaporation that heats material with an electron beam?

  1. AIt can evaporate even high-melting-point materials
  2. BIts step coverage is very high
  3. CIt forms films through chemical reactions of source gases
Show answer and explanation

Answer: A. It can evaporate even high-melting-point materials

Electron-beam evaporation focuses an electron beam on the material to heat it, so it can evaporate high-melting-point metals and oxides that are hard to melt with resistive heating. Evaporated atoms travel in straight lines, so step coverage is poor; this property is exploited in techniques such as lift-off.

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More Deposition (CVD and PVD) questions

  1. Which technique uses differences in surface materials to grow films only in specific places?
  2. What is the most appropriate range for the thickness of thin films handled in semiconductor manufacturing?
  3. Which correctly describes the basic way an LSI is built in manufacturing?
  4. What is the main reason many deposition processes are carried out in vacuum equipment?
  5. Which deposition method has mainly been used to form aluminum wiring films?