What is Siemens process?
A method that reduces trichlorosilane with hydrogen to deposit high-purity polycrystalline silicon on heated silicon rods. It is the main way to make raw silicon for semiconductors.
Field: Silicon wafers
Siemens process in the explanations
The Siemens process reacts metallurgical-grade silicon (about 98% pure) with hydrogen chloride to make trichlorosilane (SiHCl3, boiling point about 32 °C), purifies it by distillation, then reduces it with hydrogen onto silicon rods heated to about 1100 °C, depositing high-purity silicon.
Which is the typical method for producing high-purity polyc…
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Related terms
Czochralski (CZ) method Crystal orientation DZ (denuded zone) FZ method (float zone) Gettering Ingot MCZ method (magnetic-field-applied CZ) Monitor wafer Necking Notch