What is Necking?
Growing a thin neck just after the seed at the start of CZ pulling. It lets dislocations created by thermal shock when the seed touches the melt escape, giving a dislocation-free crystal.
Field: Silicon wafers
Growing a thin neck just after the seed at the start of CZ pulling. It lets dislocations created by thermal shock when the seed touches the melt escape, giving a dislocation-free crystal.
Field: Silicon wafers
Narrowing the growth to about 3–5 mm in diameter lets them, propagating at an angle to the growth axis, run out to the surface, after which a dislocation-free crystal can be expanded to full diameter (Dash necking, 1958).
In the CZ method, what is the purpose of growing a thin nec…Czochralski (CZ) method Crystal orientation DZ (denuded zone) FZ method (float zone) Gettering Ingot MCZ method (magnetic-field-applied CZ) Monitor wafer Notch Oxygen precipitates (BMD)