What is Process window?
The range of exposure dose and focus over which pattern dimensions stay within tolerance. The wider it is, the more robust manufacturing is to variation.
Field: Lithography
Process window in the explanations
k1 summarizes the combined capability of resist, mask tricks and illumination; smaller values resolve finer patterns but narrow the process window.
Which correctly describes the factor k1 in the resolution f…The process window is the range of exposure dose and focus over which feature dimensions stay within tolerance (e.g., ±10% of target), plotted as dose versus focus (an exposure-defocus window).
What is the range of exposure dose and focus over which pat…SMO (source-mask optimization) jointly optimizes, by computation, the illumination shape (source distribution in the pupil) and the mask pattern including OPC to widen the process window.
Which technique uses computation to jointly optimize the il…
Questions that mention Process window (3)
- Which correctly describes the factor k1 in the resolution formula R = k1 × λ / NA?
- What is the range of exposure dose and focus over which pattern dimensions stay within tolerance called?
- Which technique uses computation to jointly optimize the illumination shape of the exposure tool and the mask pattern to improve resolution?
Related terms
OPC (optical proximity correction) Numerical aperture (NA) ArF excimer laser Bottom anti-reflective coating (BARC) Chemically amplified resist Depth of focus (DOF) EUV lithography High-NA EUV Immersion lithography Line edge roughness (LER)