Process materials (gases and chemicals)

Which material is used for the substrates of photomasks for ArF exposure?

  1. ASynthetic quartz glass
  2. BSoda-lime glass
  3. CAluminum
Show answer and explanation

Answer: A. Synthetic quartz glass

For ArF exposure (193 nm), synthetic quartz glass, which transmits short wavelengths well and has low thermal expansion, is used for mask substrates. Patterns are formed on it with light-blocking films such as chromium or with phase-shift films. EUV masks build multilayers on special glass with even lower thermal expansion.

Practice this topic Back to topic

More Process materials (gases and chemicals) questions

  1. Which combination of materials is used in the reflective multilayer of EUV masks?
  2. In oxide etching, why are carbon-rich fluorocarbon gases such as C4F8 used?
  3. What purity is typically required for copper sputtering targets used for seed layers?
  4. What is the chemical name of IPA, used for drying after cleaning and similar purposes?
  5. Which set correctly lists the main kinds of process materials used in semiconductor manufacturing?