Oxidation and diffusion

What is the heat treatment called that heats wafers one at a time to high temperature for a few seconds using lamps or similar sources?

  1. ABatch furnace annealing
  2. BRTP (rapid thermal processing)
  3. CCMP
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Answer: B. RTP (rapid thermal processing)

RTP (rapid thermal processing) heats and cools wafers rapidly with halogen lamps or similar sources. Because the time at high temperature is short, activation annealing and thin oxide formation can be done while suppressing dopant diffusion.

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More Oxidation and diffusion questions

  1. Which value is closest to the relative permittivity of SiO2 formed by thermal oxidation?
  2. Which is one of the major reasons silicon has been so widely used as a material for MOS devices?
  3. What problem occurs when mobile ions such as sodium are present in the gate oxide?
  4. Which n-type dopant diffuses relatively slowly in silicon during heat treatment, making shallow junctions easier to form?
  5. Which correctly describes pyrogenic oxidation (hydrogen combustion oxidation)?