Oxidation and diffusion

Which n-type dopant diffuses relatively slowly in silicon during heat treatment, making shallow junctions easier to form?

  1. ABoron (B)
  2. BPhosphorus (P)
  3. CArsenic (As)
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Answer: C. Arsenic (As)

Among n-type dopants, arsenic diffuses more slowly than phosphorus, and its large mass also gives shallow implants. It has therefore been used for nMOS sources and drains that require shallow, abrupt junctions. Boron is a p-type dopant.

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