Oxidation and diffusion

Which correctly describes pyrogenic oxidation (hydrogen combustion oxidation)?

  1. AA wet oxidation method using high-purity water vapor produced by burning hydrogen and oxygen
  2. BA dry oxidation method using only dry oxygen
  3. CA method of depositing oxide by CVD
Show answer and explanation

Answer: A. A wet oxidation method using high-purity water vapor produced by burning hydrogen and oxygen

In pyrogenic oxidation, hydrogen and oxygen are burned at the furnace inlet to produce water vapor, which oxidizes the silicon. It causes less contamination than boiling deionized water and makes the amount of steam easier to control, so it is widely used for wet oxidation.

Practice this topic Back to topic

More Oxidation and diffusion questions

  1. What is the approximate breakdown field of high-quality thermal oxide (SiO2)?
  2. Which method reacts hydrogen and oxygen near the wafer surface to form a high-quality thin oxide in a short time?
  3. What is the treatment called that introduces plasma-generated nitrogen into the surface of a thin gate oxide?
  4. When etched in the same dilute hydrofluoric acid, how do the etch rates of thermal oxide and CVD oxide generally compare?
  5. Which defect grows when excess interstitial silicon generated by oxidation is injected into the silicon during thermal oxidation?