Lithography
Which patterning technique uses the tendency of block copolymers to form regular fine patterns spontaneously?
- AOPC
- BDirected self-assembly (DSA)
- CAtomic layer etching
Show answer and explanation
Answer: B. Directed self-assembly (DSA)
A block copolymer joins two polymers with different properties, which try to separate and form regular stripes or dots several nm to tens of nm in size. DSA controls their arrangement with guide patterns and is being studied as a way to make patterns finer than the lithographic resolution limit.