Deposition (CVD and PVD)

In CVD equipment, which component supplies source gas uniformly over the wafer through many small holes?

  1. AShowerhead
  2. BSusceptor
  3. CLoad port
Show answer and explanation

Answer: A. Showerhead

A showerhead is a plate with many small holes that sprays source gas uniformly over the whole wafer. In plasma CVD it may also serve as an electrode. The stage that holds and heats the wafer is called the susceptor (heater).

Practice this topic Back to topic

More Deposition (CVD and PVD) questions

  1. Which deposition method fills very narrow, deep trenches from the bottom with a flowable film and then solidifies it?
  2. What is generally done to increase the deposition rate in sputtering?
  3. For films of the same material, in what way are high-temperature thermal CVD films generally better than plasma CVD films?
  4. What is the approximate film thickness deposited in one ALD cycle?
  5. What is an advantage of vacuum evaporation that heats material with an electron beam?