Deposition (CVD and PVD)

Which correctly describes vacuum evaporation?

  1. AFilms are deposited by chemical reactions of source gases
  2. BMetal is deposited from an electrolyte
  3. CMaterial is heated in vacuum to evaporate it and deposit it on the substrate
Show answer and explanation

Answer: C. Material is heated in vacuum to evaporate it and deposit it on the substrate

Vacuum evaporation is a type of PVD in which material is heated by resistive heating or an electron beam so that it evaporates and deposits on the substrate. The equipment is relatively simple, but evaporated atoms travel in straight lines, so step coverage is poor, and sputtering is mainly used for LSI wiring.

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More Deposition (CVD and PVD) questions

  1. What problem tends to occur when a deposited thin film has large internal stress?
  2. What is the method called in which liquid material is dropped onto the center of a wafer and spun at high speed to form a uniform film?
  3. Which liquid organosilicon compound is widely used as a source for CVD of silicon oxide?
  4. Which gas is used as the source for tungsten CVD?
  5. Why has high-density plasma CVD (HDP-CVD) been used to fill narrow trenches with insulator?