Deposition (CVD and PVD)

What is the method called in which liquid material is dropped onto the center of a wafer and spun at high speed to form a uniform film?

  1. ASputtering
  2. BSpin coating
  3. CIon implantation
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Answer: B. Spin coating

In spin coating, centrifugal force spreads the liquid and throws off the excess, forming a uniform film. Thickness is adjusted by spin speed and liquid viscosity. It is used to apply photoresist and to form spin-on insulating films (SOG).

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More Deposition (CVD and PVD) questions

  1. Which liquid organosilicon compound is widely used as a source for CVD of silicon oxide?
  2. Which gas is used as the source for tungsten CVD?
  3. Why has high-density plasma CVD (HDP-CVD) been used to fill narrow trenches with insulator?
  4. Which correctly describes uses of silicon nitride (Si3N4) films?
  5. What is the main purpose of placing magnets behind the target in magnetron sputtering?