What is TDDB (time-dependent dielectric breakdown)?

A phenomenon in which an insulating film under sustained voltage eventually breaks down even below its breakdown voltage. It is used to evaluate the lifetime of gate oxides and the like.

Field: Reliability

TDDB (time-dependent dielectric breakdown) in the explanations

Questions that mention TDDB (time-dependent dielectric breakdown) (6)

  1. What is the time-dependent dielectric breakdown of the insulator between wires called, which is becoming more important as wire spacing shrinks?
  2. Which correctly describes TDDB (time-dependent dielectric breakdown)?
  3. In TDDB lifetime evaluation, why are tests run at voltages higher than the actual operating voltage?
  4. When extrapolating TDDB test results to operating voltage, there is the E model, which expresses lifetime as an exponential of field, and the 1/E model, which uses the reciprocal of field. Which statement about their difference is correct?
  5. What failure can occur when a voltage far above the rating is applied between the gate and source of a MOSFET?
  6. What is the approximate breakdown field of high-quality thermal oxide (SiO2)?

Related terms

CMP ESD (electrostatic discharge) Arrhenius model Bathtub curve Electromigration FIT rate Hot carrier injection (HCI) Latch-up MTTF (mean time to failure) NBTI (negative bias temperature instability)

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