Epitaxial growth

What is MOCVD (metal-organic chemical vapor deposition) mainly used for?

  1. AThermal oxidation of silicon
  2. BPlating copper wiring
  3. CEpitaxial growth of compound semiconductors such as GaN
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Answer: C. Epitaxial growth of compound semiconductors such as GaN

MOCVD grows compound semiconductor crystals by reacting metal-organic sources such as trimethylgallium with source gases such as ammonia. It is well suited to mass production and widely used to make GaN-based blue and white LEDs, semiconductor lasers and RF devices.

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More Epitaxial growth questions

  1. What problem tends to occur when there is a large difference in lattice constant (lattice mismatch) between the substrate and the grown film?
  2. Which is a characteristic of MBE (molecular beam epitaxy)?
  3. Which gases are used as sources for silicon epitaxial growth?
  4. Which correctly describes selective epitaxial growth?
  5. What is the phenomenon called in which impurities from the substrate or elsewhere are incorporated into the growing layer through the gas phase during epitaxial growth?