Lithography

Which is a characteristic of scanner-type exposure tools?

  1. AThey expose the whole wafer at once
  2. BThey write directly without a mask
  3. CThey expose while moving the mask and wafer synchronously relative to a slit of light
Show answer and explanation

Answer: C. They expose while moving the mask and wafer synchronously relative to a slit of light

A scanner illuminates only a narrow slit-shaped region and exposes each shot by scanning the mask and wafer synchronously. Because only the low-aberration central part of the lens is used, large fields can be exposed with high accuracy. A tool that exposes a whole shot at once while stationary is called a stepper.

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More Lithography questions

  1. Which correctly describes masks used in EUV lithography?
  2. Which is the correct general order of lithography steps?
  3. What is the technique called that transfers a pattern by pressing a mold with fine patterns into resist?
  4. Which equipment is mainly used to write the patterns of photomasks (reticles)?
  5. What is the role of the thin membrane (pellicle) stretched over a photomask at a fixed distance?