DRAM

Which pair of three-dimensional structures has been used in DRAM cells to secure capacitor capacitance?

  1. AFin and planar
  2. BTrench and stacked
  3. CFloating gate and charge trap
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Answer: B. Trench and stacked

To secure enough capacitance as cells shrink, DRAM capacitors have been made three-dimensional. There are trench capacitors, formed by etching deep holes into the substrate, and stacked capacitors, built as tall structures above the transistor; stacked capacitors are now mainstream. Floating gate and charge trap are flash memory structures.

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  1. Which correctly describes a property of DRAM?
  2. What does 'DDR (double data rate)' in DDR SDRAM mean?
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