Deposition (CVD and PVD)

Which type of CVD reactor heats only the stage holding the wafer while keeping the reactor walls cool?

  1. ACold-wall type
  2. BOpen-atmosphere type
  3. CHot-wall type
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Answer: A. Cold-wall type

A cold-wall reactor heats only the wafer (or susceptor) and keeps the walls cool, reducing film deposition on the walls and particles from them. It is used in single-wafer epi tools and similar. A hot-wall reactor, which heats the whole furnace, makes it easy to process many wafers at a uniform temperature and is used in LPCVD batch furnaces and the like.

  • A. Correct. Only the wafer side is heated.
  • B. CVD is normally done in a reactor with a controlled atmosphere.
  • C. A hot-wall reactor heats the whole furnace.
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More Deposition (CVD and PVD) questions

  1. Which is an example of the precursors used to deposit HfO2 gate dielectrics by ALD?
  2. Which model organizes, by temperature and gas pressure, the tendency of sputtered metal films to form columnar grains with many voids at low deposition temperatures?
  3. In CVD, what is the phenomenon called in which more source gas is consumed and the deposition rate drops as the area of wafers or patterns being coated increases?
  4. In reactive sputtering, what is the phenomenon called in which, with too much reactive gas flow, the target surface becomes covered with a compound and the deposition rate drops sharply?
  5. Which method is used to tune the stress of plasma CVD silicon nitride from compressive to tensile?