SRAM and flash memory
In charge-trap cells, widely used in 3D NAND, which material is commonly used for the layer that stores charge?
- ACopper
- BSilicon nitride (SiN)
- CAluminum
Show answer and explanation
Answer: B. Silicon nitride (SiN)
Instead of a conductive floating gate, a charge-trap cell stores electrons in trap levels within silicon nitride, an insulator. Because the charge is localized in the film, interference with neighboring cells is small, and it is well suited to the vertically stacked structure of 3D NAND.