Process materials (gases and chemicals)

Which material is commonly used for CMP polishing pads?

  1. ATungsten
  2. BPolyurethane foam
  3. CQuartz glass
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Answer: B. Polyurethane foam

CMP pads are often made of polyurethane foam with fine pores. The pores and surface grooves hold slurry and spread it over the whole wafer. Because the pad surface clogs with use, it must be dressed with a diamond tool (conditioning).

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