Process materials (gases and chemicals)

What is the main composition of positive resists widely used for g-line and i-line exposure?

  1. APolyethylene and salt
  2. BMetal powder and water
  3. CNovolac resin and a diazonaphthoquinone (DNQ) photoactive compound
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Answer: C. Novolac resin and a diazonaphthoquinone (DNQ) photoactive compound

Positive resists for g-line and i-line mix an alkali-soluble novolac resin with a diazonaphthoquinone photoactive compound that inhibits dissolution. Light converts the compound so the resin dissolves readily in alkali, and the exposed areas dissolve during development. KrF and ArF use chemically amplified resists.

  • A. It is not polyethylene and salt.
  • B. It is not metal powder and water.
  • C. Correct. Novolac resin and a DNQ photoactive compound.
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