Process materials (gases and chemicals)

What is the typical method for producing, near the fab, the large volumes of nitrogen gas used in semiconductor plants?

  1. ABurning petroleum
  2. BCooling and liquefying air and separating nitrogen by differences in boiling point (cryogenic separation)
  3. CElectrolyzing water
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Answer: B. Cooling and liquefying air and separating nitrogen by differences in boiling point (cryogenic separation)

Large volumes of nitrogen are produced by cryogenic air separation, which compresses and cools air until it liquefies and separates nitrogen from oxygen and other components by their boiling points. Large fabs often place an air separation unit on site or next door and supply high-purity nitrogen by pipeline.

  • A. Burning petroleum does not yield high-purity nitrogen.
  • B. Correct. Air is liquefied and separated by boiling point.
  • C. Electrolyzing water produces hydrogen and oxygen.
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More Process materials (gases and chemicals) questions

  1. Which source gas can deposit silicon films at lower temperatures than monosilane (SiH4)?
  2. Which gas is used as the germanium source in SiGe epitaxial growth?
  3. Which gas is sometimes used as the oxidant with silane to deposit silicon oxide or oxynitride films by CVD?
  4. Why are dopant gases such as diborane and phosphine often supplied diluted to low concentrations in hydrogen, nitrogen or similar?
  5. Which measure is commonly used to express trace moisture in high-purity gases?