Oxidation and diffusion

Which chemical reaction occurs in the dry thermal oxidation of silicon?

  1. ASi + O2 → SiO2
  2. BSi + N2 → SiN
  3. CSiO2 + H2 → Si + H2O
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Answer: A. Si + O2 → SiO2

In dry oxidation, silicon reacts with oxygen at high temperature to form silicon dioxide (Si + O2 → SiO2). Wet oxidation uses steam, with the reaction Si + 2H2O → SiO2 + 2H2.

  • A. Correct. Silicon and oxygen form SiO2.
  • B. Reaction with nitrogen does not form an oxide.
  • C. This is the reverse reaction that reduces the oxide, not oxidation.
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More Oxidation and diffusion questions

  1. Which is closest to the temperature range at which silicon thermal oxidation is generally carried out?
  2. Which correctly describes "diffusion" of impurities in semiconductor manufacturing?
  3. Which is a typical use of thermally grown silicon oxide?
  4. What is the correct unit of the diffusion coefficient D?
  5. Which correctly expresses Fick's first law? (J: diffusion flux, D: diffusion coefficient, C: concentration, x: position)