LSI design flow and EDA

For layouts intended for double patterning, which correctly describes how design tools assign patterns?

  1. APut all patterns on a single mask
  2. BDelete patterns at random
  3. CSplit patterns between two masks (coloring) so that patterns on the same mask are not too close
Show answer and explanation

Answer: C. Split patterns between two masks (coloring) so that patterns on the same mask are not too close

In double patterning, patterns spaced too closely to resolve in a single exposure are split between two masks and exposed separately. Design tools color the patterns so that patterns too close to each other go on different masks, and flag any arrangement that cannot be colored as an error to be fixed.

Practice this topic Back to topic

More LSI design flow and EDA questions

  1. Which correctly describes a netlist?
  2. In logic synthesis and static timing analysis, what is the description of timing conditions such as clock period and I/O delays called?
  3. Which are the typical formats of layout data handed to manufacturing for mask making?
  4. Which step at the start of place and route decides the rough placement of large circuit blocks, I/O pins, power wiring and the like?
  5. In RTL verification, which metric is used to evaluate how thoroughly verification has been done?