Cleanrooms and equipment

Which term refers to gaseous contaminants (acids, bases, organics, etc.) rather than particles in a cleanroom?

  1. AParticle contamination
  2. BAirborne molecular contamination (AMC)
  3. CElectrostatic discharge (ESD)
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Answer: B. Airborne molecular contamination (AMC)

AMC (Airborne Molecular Contamination) refers to molecular contaminants in the air such as acidic and basic gases, organics and dopants. Ordinary filters cannot remove them, so chemical filters are used. They affect resist performance and the condition of wafer surfaces.

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More Cleanrooms and equipment questions

  1. In 300 mm wafer fabs, which system automatically transports FOUPs between tools along rails on the ceiling?
  2. Which facility at a cleanroom entrance blows strong jets of clean air at workers to remove dust from the surface of their clothing?
  3. What is the main reason temperature is held extremely constant in cleanrooms, especially in exposure areas?
  4. What is used with precision equipment such as exposure tools to suppress the effects of vibration transmitted from the floor?
  5. Which device supplies ions to the air in a cleanroom to neutralize charge on wafers and equipment?