Process materials (gases and chemicals)

For what purpose is ultrapure water used in the largest quantities in semiconductor fabs?

  1. ADrinking water for workers
  2. BOnly humidification for air conditioning
  3. CWafer cleaning and rinsing
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Answer: C. Wafer cleaning and rinsing

Ultrapure water is used in large quantities in wafer cleaning, above all for rinsing after chemical cleaning. Because even trace impurities contaminate wafers, water with ions, organics, particles and dissolved gases removed to the utmost is required.

  • A. Drinking water is managed separately.
  • B. It is not used only for humidification.
  • C. Correct. It is used in large quantities for cleaning and rinsing.
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More Process materials (gases and chemicals) questions

  1. What is the main reason extremely high purity is required of the gases and chemicals used in semiconductor manufacturing?
  2. Which combination of material and surface treatment is commonly used for high-purity gas piping?
  3. Which device in deposition and etch tools precisely measures gas flow and controls it to stay constant?
  4. What is the main composition of positive resists widely used for g-line and i-line exposure?
  5. Which material is widely used for piping and containers of highly corrosive chemicals such as hydrofluoric acid?