Ion implantation

Which type of ion implanter is used to implant large doses in a short time, as for source/drain formation?

  1. AHigh-energy implanter
  2. BHigh-current implanter
  3. CMedium-current implanter
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Answer: B. High-current implanter

Ion implanters are classified by beam current and energy into high-current, medium-current and high-energy types. High-dose implants around 10¹⁵ ions/cm², such as for sources and drains, use high-current implanters that can deliver large beam currents.

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More Ion implantation questions

  1. Under the same annealing conditions, how does the sheet resistance of the implanted layer generally change when the implant dose is increased?
  2. What must be considered when using photoresist as a mask for ion implantation?
  3. What is an advantage of plasma doping, in which the wafer is exposed directly to a dopant-containing plasma and implanted with low-energy ions?
  4. When implanting with the wafer tilted, what is the phenomenon called in which areas in the shadow of tall patterns such as resist receive no implant?
  5. When dopants are activated by annealing, which property sets the upper limit of the concentration that can be electrically activated?