Ion implantation

In an ion implanter, which part uses a magnetic field to select only the desired ion species?

  1. AIon source
  2. BEnd station (wafer processing chamber)
  3. CMass analyzer
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Answer: C. Mass analyzer

The ion source also produces unwanted ions, so the mass analyzer bends ion trajectories with a magnetic field and selects only the desired ions according to their mass-to-charge ratio. The selected ions are accelerated and implanted into the wafer in the end station.

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More Ion implantation questions

  1. What is the main advantage of ion implantation over thermal diffusion?
  2. What is the purpose of pre-amorphization implantation (PAI)?
  3. What is used to suppress wafer charging (charge-up) during ion implantation?
  4. Singly charged ions are implanted into a wafer area of 100 cm² at a dose of 1×10¹⁵ ions/cm². With a beam current of 1 mA, approximately how long does the implant take? (Elementary charge 1.6×10⁻¹⁹ C)
  5. In CMOS well formation, what is a well called in which high-energy implantation makes the dopant concentration higher deep below the surface?