CMP and cleaning

What is the operation called in which the surface of a CMP pad is dressed with a diamond tool to stabilize the removal rate?

  1. AAshing
  2. BPad conditioning (dressing)
  3. CDicing
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Answer: B. Pad conditioning (dressing)

As polishing continues, the pad surface glazes and clogs with debris, lowering the removal rate. A conditioner with diamond grit abrades the pad surface to restore its fine texture, stabilizing the removal rate.

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More CMP and cleaning questions

  1. Compared with planarization by thermal reflow or etch-back, what is an advantage of CMP?
  2. Which correctly describes the order and purposes of SC-1 and SC-2 in standard RCA cleaning?
  3. What is the main cause of pattern collapse when cleaning and drying high-aspect-ratio patterns?
  4. Why are oxidizers such as hydrogen peroxide added to the slurry in tungsten CMP?
  5. What is a correct design countermeasure to the CMP removal amount varying with pattern density within a chip?