Etching

What is the role of etching in semiconductor manufacturing?

  1. ARemoving film from areas not covered by a mask such as resist to form patterns
  2. BDiffusing impurities
  3. CDepositing films on the wafer
Show answer and explanation

Answer: A. Removing film from areas not covered by a mask such as resist to form patterns

Etching uses a resist pattern made by lithography, or a similar mask, to remove film or substrate from uncovered areas by chemical reaction or ion bombardment, shaping the circuit pattern.

  • A. Correct. Uncovered areas are removed to form patterns.
  • B. Diffusing impurities is a heat-treatment step.
  • C. Adding films is the deposition step.
Practice this topic Back to topic

More Etching questions

  1. Which correctly describes the "plasma" used in dry etching?
  2. If etching proceeds at 100 nm/min for 3 minutes, how much film is removed?
  3. In wet etching, how does the etch rate generally change when the solution temperature is raised?
  4. In plasma tools such as capacitively coupled ones, what is the phenomenon called in which the wafer-side electrode naturally acquires a negative DC potential that accelerates ions toward the wafer?
  5. What is the masking scheme called that stacks three layers, an organic (carbon) film at the bottom, a silicon-containing middle layer and resist on top, to etch fine patterns deeply?