Environment, health and safety
For chamber cleaning of CVD equipment, which method has been adopted to reduce PFC emissions?
- AIncrease cleaning with C2F6
- BRemote plasma, which decomposes NF3 outside the chamber and cleans efficiently with the resulting fluorine radicals
- CDo no cleaning at all
Show answer and explanation
Answer: B. Remote plasma, which decomposes NF3 outside the chamber and cleans efficiently with the resulting fluorine radicals
Chambers used to be cleaned by turning PFCs such as C2F6 into plasma inside the chamber, but large amounts were emitted undecomposed. The remote plasma method decomposes NF3 highly efficiently outside the chamber and sends only fluorine radicals into it, greatly reducing greenhouse gas emissions.