CMP and cleaning

What is the main purpose of diluting chemicals or using functional water in recent cleaning processes?

  1. ATo reduce chemical use and environmental impact
  2. BTo always strengthen cleaning power
  3. CTo change the color of the wafer
Show answer and explanation

Answer: A. To reduce chemical use and environmental impact

Cleaning used to consume large amounts of concentrated chemicals, but diluting chemicals and using functional waters such as ozonated or hydrogenated water reduce the use of chemicals and ultrapure water and the amount of waste while achieving the needed cleaning effect.

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More CMP and cleaning questions

  1. What is the main purpose of cleaning the back and edge (bevel) of wafers?
  2. What is the main reason wafer cleaning is considered important in semiconductor manufacturing?
  3. Which correctly describes how many times cleaning is performed across the whole LSI manufacturing flow?
  4. Which set correctly lists the kinds of surface contamination removed from wafers by cleaning?
  5. In processes such as multilevel wiring, what is the main reason the wafer surface must be planarized by CMP?