Ion implantation

Which pair correctly names the two mechanisms by which implanted ions lose energy in a material?

  1. ACollisions with nuclei (nuclear stopping) and interaction with electrons (electronic stopping)
  2. BHeat conduction and radiation
  3. CElectrical resistance and magnetoresistance
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Answer: A. Collisions with nuclei (nuclear stopping) and interaction with electrons (electronic stopping)

Ion energy loss is divided into nuclear stopping, from elastic collisions with nuclei, and electronic stopping, from exciting and ionizing electrons. Nuclear stopping dominates for heavy ions and low energies, electronic stopping for light ions and high energies. Nuclear stopping is the main cause of crystal damage.

  • A. Correct. Nuclear and electronic stopping.
  • B. Heat conduction and radiation are not the main ways ions stop.
  • C. These are not kinds of resistance.
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More Ion implantation questions

  1. When implanting aluminum or similar into SiC, why is the wafer often heated to several hundred degrees Celsius during implantation (hot implantation)?
  2. Which element, heavier than boron, has been considered and used as a p-type dopant to create steep retrograde profiles in nMOS channels?
  3. What problem tends to arise when removing photoresist that has received a high-dose ion implant?
  4. In ion implantation, which parameter mainly determines how deep the dopants are implanted (the range)?
  5. What is the main purpose of annealing (heat treatment) after ion implantation?