CMP and cleaning
What is an advantage of single-wafer cleaning tools, which process one wafer at a time?
- AThey can process large numbers of wafers at once
- BThey use no chemicals at all
- CCross-contamination between wafers is unlikely, and conditions are easy to control for each wafer
Show answer and explanation
Answer: C. Cross-contamination between wafers is unlikely, and conditions are easy to control for each wafer
Single-wafer cleaning sprays chemicals onto a spinning wafer and processes wafers one at a time, so contamination is unlikely to transfer from other wafers and conditions can be finely controlled. Batch tools that immerse many wafers in chemical tanks have high throughput but risk cross-contamination. Single-wafer cleaning is increasingly used in advanced processes.